IONPURE VNX55-E High-Flow CEDI Module 18 MΩ-cm Ultrapure Water for Microelectronics High Purity Water Treatment Systems

　　IONPURE VNX55-E is a high-flow continuous electrodeionization(CEDI)module delivering 12.5 m³/h(55 gpm)nominal product water flow for semiconductor and ultrapure water systems.Engineered as a chemical-free cedi module for high purity water treatment systems,it guarantees 18 MΩ·cm resistivity with≥95%silica and boron removal.Suited for microelectronics rinse water,wafer fab UPW loops,and power generation boiler feed.

　　What Is a High-Flow CEDI Module?

　　A high-flow CEDI module is an electrochemical water purification device that continuously removes ionized and ionizable contaminants from reverse osmosis(RO)permeate to produce ultrapure water without chemical regeneration.Unlike conventional mixed-bed ion exchange,CEDI modules use ion-exchange membranes,ion-exchange resins,and a DC electrical potential to drive ion migration,splitting water into H+and OH-ions for in-situ resin regeneration.This eliminates acid/caustic handling,neutralizing tanks,and regeneration downtime.

　　The VNX55-E represents the highest nominal flow capacity within the IONPURE VNX series,rated at 12.5 m³/h per module.It is specifically optimized for microelectronics fabrication,where ppb-level silica,boron,sodium,and chloride control is mandatory for wafer yield protection.Multiple VNX55-E modules can be manifolded in parallel to build systems exceeding 228 m³/h(1,000 gpm).

　　Key Specifications

　　Nominal Product Flow:12.5 m³/h per module(55 gpm)

　　Product Water Resistivity:≥18 MΩ·cm(guaranteed)

　　Silica(SiO₂)Removal:≥95%

　　Boron Removal:≥95%

　　Sodium(Na⁺)Removal:≥99.8%

　　Chloride(Cl⁻)Removal:≥99.8%

　　Water Recovery:98.5%to 99%

　　Operating DC Voltage Range:0 to 300 V

　　Operating DC Current Range:2.0 to 13.2 A

　　Feed Water Conductivity:<10µS/cm(secondary RO or DI water required)

　　Feed Water Temperature Range:20°C to 45°C

　　Feed Water Pressure Range:1.4 to 7 bar(20 to 100 psi)

　　Feed Water Residual Chlorine:<0.02 ppm

　　Feed Water Total Hardness:<0.1 ppm(as CaCO₃)

　　Feed Water Reactive Silica:<0.2 ppm

　　Maximum Ambient Temperature:≤45°C

　　Installation Environment:Indoor,avoid direct sunlight

　　Module Diameter:44.45 cm

　　Module Width:50.8 cm

　　Module Height:50.8 cm

　　Module Length:213.3 cm

　　Connections:Through-port gasket design,50 mm butt-weld polypropylene(PP)connectors included

　　Junction Box:Pre-wired junction box included

　　Certifications:CE Mark,manufactured under ISO 9001 and ISO 14001 certified quality management systems

　　Typical Product Resistivity Performance:17.5 to 18 MΩ·cm

　　Technical Highlights

　　Thin-cell concentrate compartment eliminates brine injection.The proprietary thin-cell design concentrates rejected ions without requiring external brine feed or concentrate recirculation pumps,simplifying system piping and reducing auxiliary equipment count.

　　Through-port gasket seal prevents inter-circuit leakage.Each connection point uses a through-port compression gasket that isolates product,concentrate,and electrode streams.Common O-ring groove failure modes encountered with conventional plate-and-frame designs are eliminated,reducing unscheduled downtime risk in continuous 24/7 fab operations.

　　Integrated flow distribution optimizes current efficiency.The module's internal flow path and resin packing arrangement maintain uniform current density across the entire membrane active area.This prevents localized hotspots that degrade membrane life and ensures the guaranteed silica and boron rejection performance across 98.5%to 99%water recovery.

　　Chemical-free operation reduces OPEX and EHS burden.Electrochemical regeneration occurs continuously within the module—no acid,caustic,or neutralizing chemicals are required.A common purchasing question is whether CEDI modules need periodic resin replacement or chemical cleaning.IONPURE VNX55-E modules operate for years without resin replacement;cleaning frequency depends entirely on feed water compliance with the specified minimum inlet quality.

　　Applications

　　Semiconductor wafer fab ultrapure water polishing:Receives secondary RO permeate and polishes to 18 MΩ·cm for immersion lithography,wet etch,and post-CMP cleaning.Silica and boron removal≥95%protects against microcircuit defect formation in sub-10 nm node processes.

　　Flat panel display(FPD)manufacturing rinse water:Delivers consistent high-purity rinse water for LCD and OLED substrate cleaning.The 12.5 m³/h per module flow rate allows compact system footprints for Gen 8.5 and Gen 10.5 fab UPW plants.

　　Power generation high-pressure boiler feed water:Polishes RO permeate to sub-0.1µS/cm conductivity for high-pressure boiler makeup in combined-cycle gas turbine and supercritical coal plants.Sodium removal≥99.8%prevents turbine blade corrosion and silica scaling.

　　Pharmaceutical purified water(PW)and water for injection(WFI)pretreatment:Serves as pre-polishing stage upstream of distillation or final UF.Eliminates chemical handling associated with off-site regenerated service DI exchange,simplifying USP and EP compliance audits.

　　Large-scale UPW central plant expansion:Multiple VNX55-E modules manifolded in parallel produce over 228 m³/h for campus-wide distribution loops.The built-in junction box and included 50 mm PP butt-weld connectors reduce field piping labor and electrical termination time during installation.

　　Selection Guidance

　　Suitable applications:

　　Large ultrapure water systems requiring≥12.5 m³/h per polishing train with feed conductivity consistently<10µS/cm from upstream RO

　　Semiconductor and microelectronics fabs where silica,boron,sodium,and chloride removal specifications are critical for wafer processing

　　Facilities seeking to eliminate hazardous chemical handling—no bulk acid or caustic storage,no neutralization system,no waste brine discharge permit burden

　　Indoor control rooms or water treatment buildings with ambient temperature maintained at or below 45°C and no direct sunlight on modules

　　Not recommended for:

　　Feed water with conductivity exceeding 10µS/cm or hardness>0.1 ppm without pretreatment upgrade.Exceeding the inlet specification reduces product resistivity,accelerates scaling within concentrate compartments,and may permanently damage ion-exchange membranes.

　　Applications requiring product water resistivity below 10 MΩ·cm at full flow.In such cases,a smaller CEDI module from the IONPURE VNX-CDIT or IP-LXM series may provide more proportionate capital cost per unit of flow.

　　Outdoor installations without weather-protective enclosures.The VNX55-E is rated for indoor use;UV exposure and freeze-risk environments require a temperature-controlled shelter.

　　FAQ

　　1.What are the footprint and installation dimensions of the IONPURE VNX55-E?

　　The module body is 213.3 cm long,50.8 cm wide,and 50.8 cm high with a diameter of 44.45 cm.Allow additional clearance for 50 mm butt-weld PP connection fittings and front-side junction box access.

　　2.How long is the typical delivery time or lead time for a VNX55-E?

　　Standard lead time is 8 to 12 weeks from factory order confirmation.For urgent project timelines,expedited manufacturing slots can reduce delivery to 6 weeks.

　　3.What feed water quality is required to operate the VNX55-E reliably?

　　Feed water must be secondary RO permeate or DI-quality water with conductivity<10µS/cm,temperature 20-45°C,pressure 1.4-7 bar,residual chlorine<0.02 ppm,hardness<0.1 ppm as CaCO₃,and reactive silica<0.2 ppm.Operating outside these limits reduces product water resistivity and may void warranty coverage.

　　4.How much does the IONPURE VNX55-E CEDI module cost?What is the price?

　　The VNX55-E typically ranges from 65,000to85,000 USD per module depending on system configuration volume and regional delivery terms.Prices fluctuate due to exchange rates,tariffs,and factory adjustments.For an accurate quotation with current pricing and shipping costs,contact Beijing Zhongping Technology directly.

　　5.What payment terms are available when purchasing the VNX55-E?

　　We accept wire transfer(T/T)and irrevocable letter of credit(L/C)at sight.For qualified industrial accounts,Beijing Zhongping Technology offers staged payments tied to factory acceptance test milestones.

　　6.Can the VNX55-E operate at partial flow,for example during commissioning or low-demand periods?

　　Yes,the module can operate at reduced flow by adjusting the DC current proportionally.Maintain feed water flow within 60%to 110%of nominal rating and adjust voltage to sustain target current density for optimal ion removal.

　　7.What water recovery rate does the VNX55-E achieve and how is concentrate handled?

　　The module achieves 98.5%to 99%recovery.The remaining 1%to 1.5%concentrate stream can be returned to the RO feed tank or discharged,as it contains only concentrated feed salts without added chemicals.

　　8.Is the VNX55-E compatible with existing PLC-based supervisory control and data acquisition systems?

　　Yes,the pre-wired junction box provides DC power input terminals.Users supply external DC power(rated to 0-300 VDC,2.0-13.2 A)from a rectifier controlled by a 4-20 mA or 0-10 VDC analog signal from the plant SCADA or PLC.

　　9.What warranty does the VNX55-E carry and are extended service agreements available?

　　We provide a standard 12-month warranty from commissioning or 18 months from shipment,whichever occurs first.Extended warranty programs including annual performance audits and membrane integrity testing are available from Beijing Zhongping Technology.

　　10.How are replacement or expansion VNX55-E modules matched hydraulically to existing manifolds?

　　All VNX55-E modules share identical hydraulic resistance and port geometry.New modules can be added to an existing parallel manifold without orificing rebalancing.Provide system design flow and current load per train when ordering,and Beijing Zhongping Technology supplies a manifold connection drawing and electrical loading schedule.